Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2005-06-02
2008-11-04
Vo, Peter DungBa (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S601000, C029S831000, C029S840000, C029S846000, C343S7000MS
Reexamination Certificate
active
07444735
ABSTRACT:
A system for manufacturing an integrated circuit system having a substrate with a integrated circuit device. A first pad is formed on the substrate and connected to the integrated circuit device. A first dielectric layer is formed over the substrate and the first pad, with the first dielectric layer having an opening provided therein exposing the first pad. An upper redistribution layer is formed over the first dielectric layer. A portion of the upper redistribution layer is formed into an antenna with the antenna connected to the first pad. A second dielectric layer is formed over the first dielectric layer and over the antenna.
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Bay Stanley
Cheong Kai Keong
Lo Marvin
Tan Victor
Yeo David
Chartered Semiconductor Manufacturing Ltd.
Ishimaru Mikio
Nguyen Tai
Vo Peter DungBa
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