Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1983-06-28
1984-08-07
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430313, 430314, 430317, 430316, 430270, 430272, 427 38, 156643, 1566591, 156668, G03C 500
Patent
active
044644604
ABSTRACT:
A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.
REFERENCES:
patent: 3615538 (1971-10-01), Peters et al.
patent: 4036813 (1977-07-01), Hardman et al.
patent: 4356246 (1982-10-01), Tabei et al.
"Multi-Layer Resist Systems", B. J. Lin, Chapter in Introduction to Microlithography, Thompson, Willson & Bowden, Editors, American Chemical Society, (1982).
Hiraoka Hiroyuki
Hofer Donald C.
Miller Robert D.
Pederson Lester A.
Willson Carlton G.
Dees Jos,e G.
International Business Machines - Corporation
Kittle John E.
Walsh Joseph G.
LandOfFree
Process for making an imaged oxygen-reactive ion etch barrier does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for making an imaged oxygen-reactive ion etch barrier, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for making an imaged oxygen-reactive ion etch barrier will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-604209