Process for increasing thermostability of a resist through elect

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

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430328, 430330, 430942, G03C 500

Patent

active

060870710

ABSTRACT:
A process for curing a resist in which a resist is cured quickly and with high efficiency without gas, which is formed by irradiation with electron beams with which the resist is irradiated for curing, remaining in it and thereby increase its thermostability, is achieved by the following process steps:

REFERENCES:
patent: 4842992 (1989-06-01), Arai
Japanese No. 4-78982, Mar. 12, 1992, First page which corresponds to U.S. Patent No. 4,842,992.

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