Process for forming thermally stable negative images on surfaces

Details Process for forming thermally stable negative images on surfaces Process for forming thermally stable negative images on surfaces

1985-11-14

1986-12-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430156, 430167, 430312, 430323, 430330, G03F 726

Patent

active

046312498

ABSTRACT:
This invention relates to negative photoresist systems containing thermally stable polyglutarimide polymers dissolved in suitable solvents. The negative resists are useful for producing high resolution images on surfaces by exposing the resist to a wide range of exposing radiation wavelengths and by subsequently developing the unexposed resist with an organic solvent or an aqueous base developer. The polyglutarimide polymers can be formulated so that they are partially soluble in an aqueous base, compatible with aqueous base soluble photosensitizers, and developable in aqueous base solutions, thereby eliminating the need for the use of any organic solvent.

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