Process for forming patterns using ionizing radiation sensitive

Details Process for forming patterns using ionizing radiation sensitive Process for forming patterns using ionizing radiation sensitive

1985-05-20

1986-11-18

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430311, 430296, 430322, 526247, 526251, 5262929, 526293, G03C 500

Patent

active

046236090

ABSTRACT:
An ionizing radiation sensitive resist consisting essentially of a polymer having a recurring unit represented by the following formula: ##STR1## wherein X is a hydrogen atom, a methyl group, or a halogen atom and R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5, which may be identical or different, are hydrogen atoms, halogen atoms, alkyl groups having 1 to 3 carbon atoms, alkoxy groups having 1 to 3 carbon atoms, haloalkyl groups having 1 to 3 carbon atoms or haloalkoxy groups having 1 to 3 carbon atoms, at least a part of the X groups present in said polymer being a halogen atom, at least a part of the Y.sup.1 and Y.sup.2 group present in said polymer being a halogen atom, and at least a part of the R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 groups present in said polymer being a haloalkyl or haloalkoxy group having 1 to 3 carbon atoms. Said ionizing radiation sensitive resist is suitable as a negative type resist. This resist is used in the form of an organic solvent solution to form a coating film on a substrate and the desired parts of this coating film are irradiated with an ionizing radiation, whereby patterns are formed.

REFERENCES:
patent: 3068214 (1962-12-01), Rassweiler et al.
patent: 3168502 (1965-02-01), Sexsmith et al.
patent: 4286049 (1981-08-01), Imamura et al.

Affiliated with

Also associated with

Rating

Process for forming patterns using ionizing radiation sensitive does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for forming patterns using ionizing radiation sensitive , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for forming patterns using ionizing radiation sensitive will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1617526