Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1993-08-03
1994-05-10
Rodee, Christopher
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430311, 430330, 430283, G03C 556
Patent
active
053106253
ABSTRACT:
The present invention relates to an improved process for forming negative tone images of photosensitive polyimides on a substrate having improved wall angles.
REFERENCES:
patent: 2880230 (1959-03-01), Edwards et al.
patent: 3179630 (1965-04-01), Endrey et al.
patent: 3179631 (1965-04-01), Endrey et al.
patent: 3179632 (1965-04-01), Hendrix et al.
patent: 3179633 (1965-04-01), Endrey et al.
patent: 3261811 (1966-07-01), Tatum
patent: 3282898 (1966-11-01), Angelo et al.
patent: 3316212 (1967-04-01), Angelo et al.
patent: 3376260 (1968-04-01), Fritz et al.
patent: 3423366 (1969-01-01), De Brunner et al.
patent: 3518219 (1970-06-01), Lavin et al.
patent: 4218555 (1980-08-01), Antonoplos et al.
patent: 4242437 (1980-12-01), Rohloff
patent: 4252707 (1981-02-01), Ruid
patent: 4451551 (1984-05-01), Kataoka et al.
patent: 4849501 (1989-07-01), Diller et al.
patent: 4898806 (1990-02-01), Pfeifer
patent: 4942108 (1990-07-01), Moreau et al.
patent: 5122440 (1992-06-01), Chien
Lavrov et al., "Kinetics and Mechanism of the Cyclization of Polyamido Esters to Polyimides", A. N. Vysokomol. Soedin., Ser. B 1978, 20(10), 786-8.
Mikitaev et al., "Imiting Steps in the Solid-Phase Cyclization of Polyaminoacids", Doklady Akademii Nauk SSSR, vol. 283, No. 1, pp. 133-135, 1985.
Nobuyuki et al., "Preparation of Aromatic Polyimides Containing Polyamic Acid Structure", (Mitsui Toatsu Chemicals, Inc.), Chemical Abstracts, vol. 114, 43797e.
Koton et al., "Investigation of the Kinetics of Chemical Imidization", Polymer Science U.S.S.R., vol. 24, No. 4, p. 800, 1982.
Rubner et al., "A Photopolymer--The Direct Way to Polyimide Patterns", Photographic Science and Engineering, vol. 23, No. 5, Sep./Oct. 1979, pp. 303-309.
Pottiger, "Second Generation Photosensitive Polyimide Systems", Solid State Technology/Dec. 1989, pp. S1-S4.
Moore et al., "An Intrinsically Photosensitive Polyimide", Chemistry of Materials, 1 163 (1988).
Omote et al., "Fluorine-Containing Photoreactive Polyimide: 4. The Dependence of the Content of Pendant O-Naphthoquinonediazide on the Mechanism of Photochemical Reaction in a Novel Photoreactive Polyimide", Polymer Communications, 1990, vol. 31, April, pp. 134-136.
Omote et al., "Fluorine-Containing Photoreactive Polyimide 5: A Novel Positive-Type Polyimide Based on Photoinducted Acidolysis", Journal of Polymer Science: Part C: Polymer Letter, vol. 28, pp. 59-64 (1990).
"Photosensitive Polyimides", Ube INdustries, Ltd., Jpn. Kokai Tokkyo Koho JP 59,108,031 [84,108,031[, Jun. 22, 1984, abstract.
"Photosensitive Polyimides Soluble in Organic Solvents", Ube Industries Ltd., Jpn. Kokai Tokkyo Koho JP 60 06,729 [85 06,729], Jan. 14, 1985, abstract.
"Organic-Solvent-Soluble Photosensitive Poly Amide-Imides", Ube Industries, Ltd. Jpn. Kokai Tokkyo Koho JP 60 06,728 [85 06,728], Jan. 14, 1985, abstract.
Vinogradova et al., "Chemical Cyclization of Poly (Amido-Acids) in Solution" Vysokomol. Soyed A16 No. 3, 506, 1974.
Bessonov et al., "Polyimides Thermally Stable Polymers", Consultants Bureau Publishers, 1987.
Craig, "Polyimide Coatings", E. I. DuPont de Nemours & Company Inc., Electronic Materials Handbook, vol. 1: Packaging, ASM International, 1989.
Yoda et al., "New Photosensitive High Temperature Polymers for Electronic Applications", J. Macromol. Sci.-Chem., A21(13&14), pp. 1641-1663 (1984).
Pfeifer et al., "Direct Photoimaging of Fully Imidized Solvent-Soluble Polyimides", Central Research Laboratories and Plastics and Additives Division, Product Development, Ciba-Geigy Ltd., CH-4002 Basle/Switzerland.
Angelopoulos Marie
Berger Daniel G.
Labadie Jeffrey W.
Perfecto Eric D.
Sanchez Martha I.
International Business Machines - Corporation
Martin Robert B.
Rodee Christopher
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