Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2002-06-19
2004-01-06
Elms, Richard (Department: 2824)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S259000, C257S328000, C257S329000, C257S330000
Reexamination Certificate
active
06673681
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to semiconductor devices and, more particularly, to a trench MOS-gated power device having a segmented trench and an extended doping zone, and a process for forming such a device.
BACKGROUND OF THE INVENTION
An MOS transistor having a trench gate structure offers important advantages over a planar transistor for high current, low voltage switching applications. The DMOS trench gate typically includes a trench extending from the source to the drain and having sidewalls and a floor that are each lined with a layer of thermally grown silicon dioxide. The lined trench is filled with doped polysilicon. The structure of the trench gate allows less constricted current flow and, consequently, provides lower values of specific on-resistance. Furthermore, the trench gate makes possible a decreased cell pitch in an MOS channel extending along the vertical sidewalls of the trench from the bottom of the source across the body of the transistor to the drain below. Channel density is thereby increased, which reduces the contribution of the channel to on-resistance. The structure and performance of trench DMOS transistors are discussed in Bulucea and Rossen, “Trench DMOS Transistor Technology for High-Current (100 A Range) Switching,” in
Solid-State Electronics,
1991, Vol. 34, No. 5, pp 493-507, the disclosure of which is incorporated herein by reference. In addition to their utility in DMOS devices, trench gates are also advantageously employed in insulated gate bipolar transistors (IGBTs), MOS-controlled thyristors (MCTs), and other MOS-gated devices.
FIG. 1
schematically depicts the cross-section of a trench-gated N-type MOSFET device
100
of the prior art formed on an upper layer
101
a
of an N+ substrate
101
. Device
100
includes a trench
102
whose sidewalls
103
and floor
104
are lined with a gate dielectric such as silicon dioxide. Trench
102
is filled with a conductive material
105
such as doped polysilicon, which serves as an electrode for gate region
106
.
Upper layer
101
a
of substrate
101
further includes P-well regions
107
overlying an N-drain zone
108
. Disposed within P-well regions
107
at an upper surface
109
of upper layer
101
a
are heavily doped P+ body regions
110
and heavily doped N+ source regions
111
. An interlevel dielectric layer
112
is formed over gate region
106
and source regions
111
. Contact openings
113
enable metal layer
114
to contact body regions
110
and source regions
111
. The rear side
115
of N+ substrate
101
serves as a drain.
Although
FIG. 1
shows only one MOSFET, a typical device currently employed in the industry consists of an array of them arranged in various cellular or stripe layouts. As a result of recent semiconductor manufacturing improvements enabling increased densities of trench gated devices, the major loss in a device when in a conduction mode occurs in its lower zone, i.e., increased drain resistivity. Because the level of drain doping is typically determined by the required voltage blocking capability, increased drain doping for reducing resistivity is not an option. Thus, there is a need for reducing the resistivity of the drain region in a semiconductor device without also reducing its blocking capability. The present invention meets this need.
SUMMARY OF THE INVENTION
The present invention is directed to a trench MOS-gated device that comprises a doped monocrystalline semiconductor substrate that includes an upper layer and is of a first conduction type. An extended trench in the substrate in the upper layer comprises two segments having differing widths relative to one another: a bottom segment of lesser width filled with a dielectric material, and an upper segment of greater width lined with a dielectric material and substantially filled with a conductive material, the filled upper segment of the trench forming a gate region.
An extended doped zone of a second opposite conduction type extends from an upper surface into the upper layer of the substrate only on one side of the trench, and a doped well region of the second conduction type overlying a drain zone of the first conduction type is disposed in the upper layer on the opposite side of the trench. The drain zone is substantially insulated from the extended zone by the dielectric-filled bottom segment of the trench.
A heavily doped source region of the first conduction type and a heavily doped body region of the second conduction type is disposed at the upper surface of the well region only on the side of said trench opposite doped extended zone. An interlevel dielectric layer is disposed on the upper surface overlying the gate and source regions, and a metal layer disposed on the upper surface of the upper layer and the interlevel dielectric layer is in electrical contact with the source and body regions and the extended zone.
The present invention is further directed to a process for constructing a trench MOS-gated device that comprises: providing a substrate having an upper surface and comprising doped monocrystalline semiconductor material of a first conduction type, and forming a trench in an upper layer of the substrate. The trench has a floor and sidewalls and further has a width and extends to a depth substantially corresponding to a width and a depth of the upper segment of an extended trench that comprises an upper segment and a bottom segment.
A masking oxide layer is formed on the substrate upper layer and on the trench floor and sidewalls and anisotropically etched to remove it from the trench floor and thereby form an opening to substrate semiconductor material underlying the floor. The semiconductor material underlying the trench floor is etched to form the bottom segment of the extended trench. The bottom segment has a lesser width relative to a greater width of the trench upper segment and extends to a depth corresponding to the total depth of the extended trench.
The remaining masking oxide layer is removed from the substrate upper layer and the trench sidewalls, and the extended trench is substantially filled with a dielectric material. A dopant of a second opposite conduction type is implanted and diffused into the upper layer on one side of the extended trench, thereby forming a doped extended zone extending into the upper layer from its upper surface. The dielectric material is selectively removed from the upper segment of the extended trench, leaving the bottom segment of the trench substantially filled with dielectric material. A floor and sidewalls comprising dielectric material are formed in the trench upper segment, which is then substantially filled with a conductive material to form a gate region.
A doped well region of the second conduction type is formed in the upper layer of the substrate on the side of the extended trench opposite the doped extended zone. A heavily doped source region of the first conduction type and a heavily doped body region of the second conduction type are formed in the well region at the upper surface of the upper layer. An interlevel dielectric layer is deposited on the upper surface overlying the gate and source regions, and a metal layer is formed over the upper surface and the interlevel dielectric layer, the metal layer being in electrical contact with the source and body regions and the extended zone.
REFERENCES:
patent: 4893160 (1990-01-01), Blanchard
patent: 5216275 (1993-06-01), Chen
patent: 5438215 (1995-08-01), Tihanyi
patent: 5442214 (1995-08-01), Yang
patent: 5473176 (1995-12-01), Kakumoto
patent: 5637898 (1997-06-01), Baliga
patent: 6198127 (2001-03-01), Kocon
patent: 6262453 (2001-07-01), Hshieh
patent: 6433385 (2002-08-01), Kocon et al.
Cumbo Joseph L.
Grebs Thomas E.
Kocon Christopher B.
Ridley Rodney S.
Elms Richard
Fairchild Semiconductor Corporation
FitzGerald Esq. Thomas R.
Wilson Christian D.
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