Process for forming fine pattern

Details Process for forming fine pattern Process for forming fine pattern

1991-05-03

1993-03-30

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430324, 430326, 430327, 430329, 430330, 430942, 156643, G03F 736, G03F 740, G03F 7039

Patent

active

051983265

ABSTRACT:
In a process using a single-layer or multi-layer resist, by using a resist material comprising an acid-decomposable polymer, an acid generator and a conducting polymer or a resist material comprising a monomer to be made reactive by an acid, an acid generator and a conducting polymer, there can be formed a fine pattern precisely without inviting charging during charged beam writing.

REFERENCES:
patent: 4702993 (1987-10-01), White et al.
patent: 4939070 (1990-07-01), Brunsvold et al.
patent: 4968583 (1990-11-01), Ohshio et al.
patent: 5019485 (1991-05-01), Nakamura et al.
patent: 5024916 (1991-06-01), Steinmann

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