Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1994-01-24
1996-06-18
Dote, Janis L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
4302701, 430313, 430317, 430323, 430325, 430330, 1566431, 15666111, 216 2, 216 44, 216 47, 216 49, 216 51, 216 74, G03C 500, G03F 7038, G03F 738, G03F 740
Patent
active
055276628
ABSTRACT:
In a process using a single-layer or multi-layer resist, by using a resist material comprising an acid-decomposable polymer, an acid generator and a conducting polymer or a resist material comprising a monomer to be made reactive by an acid, an acid generator and a conducting polymer, there can be formed a fine pattern precisely without inviting charging during charged beam writing.
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Hashimoto Kazuhiko
Nomura Noboru
Dote Janis L.
Matsushita Electric - Industrial Co., Ltd.
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