Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1985-04-16
1986-10-14
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430270, 430296, 430331, G03C 500
Patent
active
046172548
ABSTRACT:
A process for forming a detailed image having a high sensitivity to far-UV light and capable of giving a positive type image with a high precision is provided, which process comprises applying onto a base a resist solution comprising an organic solution, of a homopolymer of methyl vinyl ketone or a copolymer thereof with a comonomer of the formula R.sup.1 R.sup.2 C.dbd.CH.sub.2 wherein R.sup.1 is H or --CH.sub.3 and R.sup.2 is acetoxy, nitrile, unsubstituted or substituted aryl or ##STR1## wherein R.sup.3 is alkyl, to form a coating on the base; irradiating far-UV light; developing the coating with a developer composed mainly of a cellosolve compound; and rinsing or/and washing the resulting material.
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patent: 4302529 (1981-11-01), Lai
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patent: 4401745 (1983-08-01), Nakane et al.
Higashi Hiromi
Kinoshita Akihiro
Namariyama Yohichi
Brammer Jack P.
Chisso Corporation
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