Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1992-04-06
1994-04-05
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430330, 430331, G03F 730, G03F 732
Patent
active
053004043
ABSTRACT:
A pattern with good adhesiveness to a substrate and good shape and heat resistance can be formed by coating a pattern forming material comprising (a) a resin, (b) a photoacid generator and (c) a solvent on the substrate, exposing to deep UV light, and developing using a mixed solvent of tetramethylammonium hydroxide and an alcohol.
REFERENCES:
patent: 4384037 (1983-05-01), Hosaka et al.
patent: 4812880 (1989-03-01), Ogawa et al.
patent: 4968581 (1990-11-01), Wu et al.
Sasago Masaru
Tani Yoshiyuki
Bowers Jr. Charles L.
Matsushita Electric - Industrial Co., Ltd.
Young Christopher G.
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