Process for forming a negative resist using high energy beam

Details Process for forming a negative resist using high energy beam Process for forming a negative resist using high energy beam

1984-01-27

1986-07-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430190, 430325, 430966, 430967, G03F 726

Patent

active

046006842

ABSTRACT:
A negative type resist for high energy beam such as electron beam, X-rays or the like made from quinone diazide ester of an oligomer having a polymerization degree of 1-20, and a process for forming a pattern with the same type resist.

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Berker et al., IEEE Electron Device Letters, vol. EDL-3, No. 11, 7/1981, pp. 281-283.
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Hiraoka, H. et al., IBM Tech. Discl. Bulletin, vol. 20, No. 5, 10/1977, p. 1922.
Hatzakis, Proceedings of the IEEE, vol. 71, No. 5, pp. 570-574, May 1983.

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