Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate
2011-04-26
2011-04-26
Lindsay, Jr., Walter L (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
C438S795000, C257SE21347
Reexamination Certificate
active
07932185
ABSTRACT:
A laser annealing process capable of suppressing a variation in sheet resistance. A surface layer formed shallower than 100 nm in a substrate of semiconductor material is added with impurities. The substrate is irradiated with a laser beam or its harmonic beam emitted from a laser diode pumped to solid-state laser to activate the impurities.
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Jin Cheng-Guo
Kudo Toshio
Mizuno Bunji
Sasaki Yuichiro
Lindsay, Jr. Walter L
Panasonic Corporation
Pompey Ron
Squire Sanders & Dempsey (US) LLP
Sumitomo Heavy Industrie's, Ltd.
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