Process for fabricating a microcrystalline silicon structure

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor

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438486, 438489, H01L 2120

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active

058858849

ABSTRACT:
A film primarily comprising silicon crystal grains having a random crystal structure. The average size of the grains are within the range of approximately 50 .ANG. to 500 .ANG..

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