Process for etching titanium at a controllable rate

Details Process for etching titanium at a controllable rate Process for etching titanium at a controllable rate

1993-10-29

1994-12-27

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156651, 156638, 252 793, 252 794, H01L 2100

Patent

active

053762363

ABSTRACT:
A process for removing titanium from a device is disclosed. The titanium is etched at a controllable rate. The etchant oxidizes the titanium, and the oxidized titanium forms a complex in the etchant. When the concentration of this complex in the etchant nears its solubility limit, it precipitates and forms a film on the titanium metal surface. This film reduces the rate of the etch, enabling the amount of titanium removed by the etchant to be controlled.

REFERENCES:
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patent: 4525250 (1985-06-01), Fahrmbacker-Lutz
"Chemical and Electrochemical Properties of Titanium in Fluorine-Containing Solutions"; Zh. Prikl. Khim. (Leningrad), 46(10); abstract only; 1973.

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