Process for etching silicon nitride selectively to silicon oxide

Details Process for etching silicon nitride selectively to silicon oxide Process for etching silicon nitride selectively to silicon oxide

1987-07-17

1989-04-11

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156653, 156657, 20419237, B44C 122, C03C 1500, C03C 2506

Patent

active

048203785

ABSTRACT:
A process for etching silicon nitride which is selective to silicon oxide with a vacuum processing module which has a remote plasma, which is generated form a gas including He and SF.sub.6, introduced to the wafer face.

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