Process for etching light-shielding thin film

Details Process for etching light-shielding thin film Process for etching light-shielding thin film

1988-12-27

1990-01-09

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156651, 156656, 156657, 1566591, 156662, 156904, 20419237, C23F 102, H01L 21306, B44C 122, C03C 1500

Patent

active

048926132

ABSTRACT:
A light shielding thin film is provided on a light transmitting substrate, and the film is covered by a photoresist. The photoresist is exposed and developed to form a pattern, and the film is etched using the pattern as a mask. The pattern is then exposed through the substrate, using the film as a mask, the pattern then being developed to form a pattern of reduced size. The film is then etched using the reduced size pattern as a mask.

REFERENCES:
patent: 4514252 (1985-04-01), Roland
patent: 4544445 (1985-10-01), Jeuch et al.
patent: 4715930 (1987-12-01), Diem

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