Process for etching light-shielding thin film

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156651, 156656, 156657, 1566591, 156662, 156904, 20419237, C23F 102, H01L 21306, B44C 122, C03C 1500

Patent

active

048926132

ABSTRACT:
A light shielding thin film is provided on a light transmitting substrate, and the film is covered by a photoresist. The photoresist is exposed and developed to form a pattern, and the film is etched using the pattern as a mask. The pattern is then exposed through the substrate, using the film as a mask, the pattern then being developed to form a pattern of reduced size. The film is then etched using the reduced size pattern as a mask.

REFERENCES:
patent: 4514252 (1985-04-01), Roland
patent: 4544445 (1985-10-01), Jeuch et al.
patent: 4715930 (1987-12-01), Diem

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