Process for developing an aqueous alkaline development diazo pho

Details Process for developing an aqueous alkaline development diazo pho Process for developing an aqueous alkaline development diazo pho

1985-11-27

1987-09-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430143, 430145, 430149, 430155, 430175, 430302, 430309, 430331, G03F 708, G03F 726

Patent

active

046923977

ABSTRACT:
A method of producing a light sensitive element wherein a substrate is coated with a photosensitive layer having a particular class of diazonium salts, a colorant and a polyvinyl acetal resin. Upon imagewise exposure it is developed with an aqueous composition of salts and surfactants in the absence of organic solvents.

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patent: 3669660 (1972-06-01), Golda et al.
patent: 3679419 (1972-07-01), Gillich
patent: 4186006 (1980-01-01), Kobayashi et al.
patent: 4391897 (1983-07-01), Gracia et al.
patent: 4492748 (1985-01-01), Lutz et al.

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