Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1995-10-16
1997-08-26
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427575, 427249, 4272551, 427122, B05D 306, C23C 1626
Patent
active
056608942
ABSTRACT:
The present invention provides a process for depositing diamond by chemical vapor deposition without using conventionally-used hydrogen, which is an explosive gas, as a reaction gases. The process includes contacting a substrate with a two-component gas mixture, under the conditions of a substrate temperature of 150.degree. C.-900.degree. C., a pressure of 1-50 torr, an input microwave power of 250-450 W. The two-component gas mixture is a hydrocarbon (C.sub.x H.sub.y) plus CO.sub.2 with a flow rate ratio of the C.sub.x H.sub.y to CO.sub.2 of 0.2-0.8, or a gasified liquid state oxygen-containing hydrocarbon (C.sub.x H.sub.y O.sub.z) plus CO.sub.2 with a flow rate ratio of the C.sub.x H.sub.y O.sub.z to CO.sub.2 of 12-17. High quality diamond can be obtained even at low temperature of 180.degree. C.
REFERENCES:
Appl. Phys. Lett. 56(5), Jan. 29, 1990 by Weimer et al., entitled "Diamond Deposition at Low Substrate Temperatures", pp. 437-439.
Elsevier Science Publishers, 1992 by Ihara et al., entitled "Low-Temperature Deposition of Diamond in Temperature Range from 70 .degree. C to 700 .degree. C", pp. 187-190.
Journal of Crystal Growth 99 (1990) by Wei et al., entitled "Growth of Diamond Films at Low Pressure Using Magneto-Microwave Plasma CVD", pp. 1201-1205.
Publication entitled "Low-Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD", pp. 1483-1485.
Surface and Coatings Technology, 47 (1991) by Muranaka et al., entitled "Low Temperature Growth of Highly Purified Diamond Films Using Microwave Plasma-Assisted Chemical Vapour Deposition", pp. 1-11.
Chen et al, Surf. Coat. Technol. 52(3) 1992 pp. 205-209.
Pierson, "Handbook of Chemical Vapor Deposition (CVD) Principles, Technology and Applications", Noyes Publications, 1992 pp. 169-178.
Chen Chia-Fu
Chen Sheng-Hsiung
Hong Tsao-Ming
King Roy V.
National Science Council
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