Process and device for the ionic analysis of an insulating sampl

Radiant energy – Inspection of solids or liquids by charged particles – Positive ion probe or microscope type

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250310, 250285, 250281, 250282, H01J 37252

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active

045647585

ABSTRACT:
The invention provides a process and device for the ionic analysis of an insulating sample brought to a given negative potential, of the type in which a target on the surface of the sample to be analyzed is bombarded by means of a primary electron beam and negative ions emitted by the bombarded target are used for producing an ion image of the sample. An electron beam whose normal speed component cancels out just at level of the surface of the target is directed perpendicularly to the target.
The device comprises for this purpose a filament, brought substantially to the same negative potential as the sample, which emits the electron beam. The electron beam, after emission, is deflected by a magnetic prism so as to be brought into coincidence with the optical axis of the negative ion beam emitted by the target.

REFERENCES:
patent: 2901627 (1959-08-01), Wiskott et al.
Werner et al., "Charging of Insulators . . . ", Journal of Applied Physics, vol. 47, No. 4, Apr. 1976, pp. 1232-1242.
Hines et al., "Sputtering of Vitreous Silica . . . ", Journal of Applied Physics, vol. 32, No. 2, Feb. 1961, pp. 202-204.
Japanese Journal of Applied Physics, vol. 16, No. 8, Aug. 1977, Tokyo (JP) K. Nakamura et al.: "Detection of SiO.sub.2 from SiO.sub.2 --Si Interface by Means . . . ".

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