Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2011-01-25
2011-01-25
McDonald, Rodney G (Department: 1795)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298350, C204S298360
Reexamination Certificate
active
07875156
ABSTRACT:
A probe storage container can supply a probe in a prober apparatus without being exposed to an atmospheric air. Preferably, the probe is stored in the probe storage container by removing an oxide film in a leading end portion of the probe in accordance with a dry treatment using an ion source, for example, without being exposed to the atmospheric air. It is thus possible to replace and attach the probe with respect to the prober apparatus without being exposed to the atmospheric air, avoiding formation of an oxide film on a surface of the probe. Further, a worker attaching the probe to the prober apparatus can work without being directly in contact with the probe, and it is possible to prevent the leading end portion of the probe from being broken. Accordingly, it is possible to stably measure an electric characteristic of a semiconductor device or the like on the wafer.
REFERENCES:
patent: 5004977 (1991-04-01), Kazama
patent: 6-66557 (1994-03-01), None
patent: 6-109415 (1994-04-01), None
patent: 9-262079 (1997-10-01), None
patent: 2006-125909 (2006-05-01), None
patent: WO 2006/138593 (2006-12-01), None
Gunji Masanori
Izawa Shigeru
Nakajima Katsunori
Nara Yasuhiko
Saito Tsutomu
Crowell & Moring LLP
Hitachi High-Technologies Corporation
McDonald Rodney G
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