Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1994-12-23
1996-01-09
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427237, 427238, 427239, 4272552, 4272551, 4272557, 427307, 4271261, B05D 306, B05D 722, C23C 1642
Patent
active
054827493
ABSTRACT:
A process is disclosed for pretreating aluminum-bearing surfaces in a vacuum deposition chamber after a previous step of cleaning the chamber, and prior to depositing tungsten silicide on substrates in the chamber, which first comprises treating the aluminum-bearing surfaces with a mixture of silane and a tungsten-bearing gas, such as WF.sub.6, to form a first deposition of a silane-based tungsten silicide on the aluminum-bearing surfaces. In a preferred embodiment, the process further comprises subsequently treating the already coated aluminum-bearing surfaces of the chamber in a second step with a mixture of a tungsten-bearing gas, such as WF.sub.6, and a chlorine-substituted silane such as dichlorosilane (SiH.sub.2 Cl.sub.2), monochlorosilane (SiH.sub.3 Cl), or trichlorosilane (SiHCl.sub.3) to form a chlorine-substituted silane-based tungsten silicide deposition over the previous deposited silane-based tungsten silicide.
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Gregory, Richard B., et al., "RBS and SIMS Characterization of Tungsten Silicide Deposited by Using Dichlorosilane and Tungsten Hexafluoride", Surface and Interface Analysis, vol. 14, 1989, pp. 13-17.
Aruga Michio
Chang Mei
Telford Susan
Applied Materials Inc.
Guenzer Charles G.
King Roy V.
Taylor John P.
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