Pressure assisted wafer holding apparatus and control method

Details Pressure assisted wafer holding apparatus and control method Pressure assisted wafer holding apparatus and control method

2004-07-27

2008-11-25

Leja, Ronald W (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

Reexamination Certificate

active

07457097

ABSTRACT:
An electrostatic wafer holding apparatus includes an electrostatic chucking pedestal and a bi-directional backside conduit in fluid communication with a backside of the chucking pedestal. The bi-directional backside conduit is in fluid communication with a backside carrier gas supply line, and is further in fluid communication with a vacuum supply line.

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