Power transistor arrangement and method for fabricating it

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C257SE21419

Reexamination Certificate

active

10977118

ABSTRACT:
When fabricating trench power transistor arrangements (1) with active cell array trenches (5) and passive connecting trenches (6), the cell array trenches (5) are provided in greater width than the connecting trenches (6). An auxiliary layer (24) is deposited conformally onto a lower field electrode structure (11) in the cell array trenches (5) and the connecting trenches (6) and is etched back as far as the top edge in the connecting trenches (6), which removes it from the cell array trenches (5). The auxiliary layer (24) allows the gate oxide (20) to be patterned without a complex mask process. An edge trench (7), with an electrode, on the potential of the field electrode structure (11) shields the cell array (3) from a drain potential.

REFERENCES:
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patent: 5763915 (1998-06-01), Hshieh et al.
patent: 6413822 (2002-07-01), Williams et al.
patent: 6462376 (2002-10-01), Wahl et al.
patent: 6690062 (2004-02-01), Henninger et al.
patent: 2003/0178676 (2003-09-01), Henninger et al.
patent: 102 12 149 (2003-10-01), None
patent: 0 722 189 (1996-07-01), None
patent: WO 00/42665 (2000-07-01), None

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