Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-03-06
2007-03-06
Chaudhari, Chandra (Department: 2891)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C257SE21419
Reexamination Certificate
active
10977118
ABSTRACT:
When fabricating trench power transistor arrangements (1) with active cell array trenches (5) and passive connecting trenches (6), the cell array trenches (5) are provided in greater width than the connecting trenches (6). An auxiliary layer (24) is deposited conformally onto a lower field electrode structure (11) in the cell array trenches (5) and the connecting trenches (6) and is etched back as far as the top edge in the connecting trenches (6), which removes it from the cell array trenches (5). The auxiliary layer (24) allows the gate oxide (20) to be patterned without a complex mask process. An edge trench (7), with an electrode, on the potential of the field electrode structure (11) shields the cell array (3) from a drain potential.
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Häberlen Oliver
Hirler Franz
Kotek Manfred
Pölzl Martin
Rieger Walter
Chaudhari Chandra
Infineon - Technologies AG
Maginot Moore & Beck
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