Positive-working photoresist process employing a selected mixtur

Details Positive-working photoresist process employing a selected mixtur Positive-working photoresist process employing a selected mixtur

1990-06-04

1991-11-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430169, 430191, 430302, 430309, G03F 7023, G03F 730, G03F 732

Patent

active

050631381

ABSTRACT:
A light-sensitive composition comprising an admixture of:

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patent: 4692398 (1987-09-01), Durham
patent: 4845008 (1989-07-01), Nishioka et al.
patent: 4871645 (1989-10-01), Uenishi et al.
patent: 4883739 (1989-11-01), Sakoguchi et al.
Salamy, T. E., et al., "Solvent Effects in Positive Photoresists", Electrochemical Society Meeting, 10/19/89, 12 pp., Hollywood, Fla.
Burggraaf, P., "Positive Photoresists-1988 Trends", Semiconductor International, 4/1988, pp. 128-133.
Ethyl 3-Ethoxy Propionate Material Safety Data Sheet by Kodak Chemical Products Inc.

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