Positive tone oxygen plasma developable photoresist

Details Positive tone oxygen plasma developable photoresist Positive tone oxygen plasma developable photoresist

1986-01-14

1987-04-14

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430328, 430330, 430394, 156628, 156643, G03C 500, B44C 122

Patent

active

046578455

ABSTRACT:
A positive tone photoresist is obtained without a solvent development step. The resist is a polymer containing masked reactive functionality which is imagewise exposed to unmask the functionality then treated with a non-organometallic reagent to remask that functionality. Following flood exposure, the resist is treated with an organometallic reagent containing an element which forms a non-volatile oxide. It is then developed by means of oxygen reactive ion etching.

REFERENCES:
patent: 4396704 (1983-08-01), Taylor
patent: 4426247 (1984-01-01), Tamamura et al.
patent: 4433044 (1984-02-01), Meyer et al.
patent: 4481279 (1984-11-01), Maito
patent: 4491628 (1985-01-01), Ito et al.
patent: 4507331 (1985-03-01), Hiraoka
patent: 4596761 (1986-06-01), Brault
patent: 4613398 (1986-09-01), Chiong et al.
IBM Technical Disclosure Bulletin, vol. 27, No. 4A, Sep. 1984, "Positive-Tone Polymer Pattern Fabrication by Gas Phase Surface Modification," p. 2197.

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