Positive resist compositions and patterning process

Details Positive resist compositions and patterning process Positive resist compositions and patterning process

2007-11-20

2009-11-17

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S907000, C430S910000

Reexamination Certificate

active

07618764

ABSTRACT:
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. The acid generator (B) is a specific sulfonium salt compound. When processed by lithography, the composition is improved in resolution, and forms a pattern with a minimal line edge roughness.

REFERENCES:
patent: 5714625 (1998-02-01), Hada et al.
patent: 5902713 (1999-05-01), Hada et al.
patent: 6022666 (2000-02-01), Hada et al.
patent: 6063953 (2000-05-01), Hada et al.
patent: 6312867 (2001-11-01), Kinsho et al.
patent: 6329125 (2001-12-01), Takechi et al.
patent: 6512020 (2003-01-01), Asakura et al.
patent: 7541133 (2009-06-01), Nishi et al.
patent: 2001/0044070 (2001-11-01), Uetani et al.
patent: 2007/0184382 (2007-08-01), Yamaguchi et al.
patent: 2007/0218401 (2007-09-01), Ando et al.
patent: 7295222 (1995-11-01), None
patent: 9-73173 (1997-03-01), None
patent: 9-90637 (1997-04-01), None
patent: 9-95479 (1997-04-01), None
patent: 9-208554 (1997-08-01), None
patent: 9-230588 (1997-09-01), None
patent: 9-301948 (1997-11-01), None
patent: 2906999 (1999-04-01), None
patent: 2000-336121 (2000-12-01), None
patent: WO-2004/074242 (2004-09-01), None
N. Choi et al., Journal of Photopolymer Science and Technology, vol. 19, No. 3, pp. 313-318 (2006).
F.Houlihan et al., Journal of Photopolymer Science and Technology, vol. 19, No. 3, pp. 327-334 (2006).
P.R. Varanasi et al., Journal of Photopolymer Science and Technology, vol. 18, No. 3, pp. 381-387 (2005).
K. Kudo et al., Jounal of Photopolymer Science and Technology, vol. 8, No. 1, pp. 45-46 (1995).

Affiliated with

Also associated with

Rating

Positive resist compositions and patterning process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist compositions and patterning process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist compositions and patterning process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4055983