Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2011-06-28
2011-06-28
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S311000, C430S312000
Reexamination Certificate
active
07968276
ABSTRACT:
A positive resist composition used to form a second resist film in a method of forming a positive resist pattern, including: applying a positive resist composition on the substrate on which a first resist pattern formed of a first resist film is formed to form a second resist film; and selectively exposing the second resist film and alkali-developing the second resist film to form a resist pattern; whereinthe positive resist composition includes a resin component (A) having a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) represented by general formula (a0-2), which exhibits increased solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and an organic solvent (S) which does not dissolve the first resist film, and the resin component (A) and the acid-generator component (B) are dissolved in the organic solvent (S).
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Knobbe Martens Olson & Bear LLP
Lee Sin J.
Tokyo Ohka Kogyo Co. Ltd.
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