Positive resist composition

Details Positive resist composition Positive resist composition

1995-12-08

1997-03-18

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430914, 430921, G03C 173

Patent

active

056121709

ABSTRACT:
A positive resist composition based on a silicone polymer contains a photo acid generator which will decompose to generate an acid upon exposure to radiation. The silicone polymer includes hydroxybenzyl units wherein some OH groups are replaced by t-butoxycarbonyl, t-butoxycarbonylmethyl, trimethylsilyl or tetrahydropyranyl groups. In a first form, the photo acid generator is a specific onium salt having at least one phenyl group with a t-alkoxy, t-butoxycarbonyloxy or t-butoxycarbonylmethoxy substituent. In a second form, the composition further contains a nitrogenous compound. In a third form, the composition further contains a dissolution inhibitor in the form of a specific silicone compound. The composition is sensitive to high energy radiation and has high sensitivity and resolution.

REFERENCES:
patent: 5318876 (1994-06-01), Schwalm et al.
Abstract of JP 6-118651, Tanaka et al. (Apr. 1994).
Abstract of EP 520,265, Binder et al. (Jun. 1992).

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