Positive photoresists employing an isomeric mixture of two hexah

Details Positive photoresists employing an isomeric mixture of two hexah Positive photoresists employing an isomeric mixture of two hexah

1993-01-12

1994-03-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430191, 430192, 430193, 534557, G03F 730, G03F 7023, C07C24512

Patent

active

052945219

ABSTRACT:
Positive photoresists formulations for producing positive photoresist images having improved thermal stability yet which allow a wide variation in resin to photoactive sensitizer compound without significant changes in photospeed, thermal behavior, contrast or resolution and with virtually no less in unexposed areas of the photoresist and without significant outgassing or popping are provided by employing novel 1,2-diazonaphthoquinone-4- or -5- sulfonate esters of 2,3,4,3',4',5'-hexahydroxybenzophenone with a novel isomeric distribution of esters. The novel isomeric distribution of 1,2-diazonaphthoquinone-4- or -5- sulfonate esters of 2,3,4,3',4',5'-hexahydroxybenzophenone is characterized by two major isomers, together comprising at least about 70% by weight of the photoactive compound, and wherein the least polar isomer comprises only about 40%.

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patent: 5141838 (1992-08-01), Aoshima et al.
patent: 5178986 (1993-01-01), Zampini et al.

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