Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1984-10-01
1986-06-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430189, 430192, 430193, 430165, 430330, 534557, G03F 726
Patent
active
045967636
ABSTRACT:
The invention provides a method for producing a positive working photoresist which comprises coating at least one novolak resin, and 1-naphthalenesulfonic acid, 3-diazo-3,4-dihydro-4-oxo-,4-benzoyl-1,2,3-benzenetriyl ester onto a substrate, exposing to a u.v. light source having a wavelength of less than 380 nanometers and developing with an aqueous alkaline solution.
REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3148983 (1964-09-01), Endermann et al.
patent: 3188210 (1965-06-01), Fritz et al.
patent: 3402044 (1968-09-01), Steinhoff et al.
patent: 4125650 (1978-11-01), Chiu et al.
patent: 4409314 (1983-11-01), Buhr et al.
patent: 4467025 (1984-08-01), Goto et al.
patent: 4499171 (1985-02-01), Hosaka et al.
patent: 4576901 (1986-03-01), Stahlhofen et al.
patent: 4581321 (1986-04-01), Stahlhofen
De Forest, W. S., "Photoresist Matl's & Processes", McGraw-Hill Book Co., 1975, pp. 150-151.
DiCarlo John
Mammato Donald C.
St. Alban Jonas
Stevens Bruce M.
American Hoechst Corporation
Blasko John P.
Bowers Jr. Charles L.
Roberts Richard S.
LandOfFree
Positive photoresist processing with mid U-V range exposure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive photoresist processing with mid U-V range exposure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist processing with mid U-V range exposure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2085185