Positive photoresist composition containing photoacid generator

Details Positive photoresist composition containing photoacid generator Positive photoresist composition containing photoacid generator

1994-09-26

1996-03-12

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430329, G03F 730, G03F 740

Patent

active

054987652

ABSTRACT:
A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.

REFERENCES:
patent: 5055439 (1991-10-01), Allen et al.
patent: 5252427 (1993-10-01), Bauer et al.
patent: 5272042 (1993-12-01), Allen et al.
patent: 5279923 (1994-01-01), Hiro et al.
patent: 5403695 (1995-04-01), Hayase et al.

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