Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1992-05-18
1993-06-15
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430157, 430163, 430176, 430311, 430320, 430326, 430327, 430330, 430942, G03F 730, G03F 738, G03F 7021
Patent
active
052197115
ABSTRACT:
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.
REFERENCES:
patent: 3062644 (1962-11-01), Neugebauer
patent: 3219447 (1965-11-01), Neugebauer et al.
patent: 3779778 (1973-12-01), Smith et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4546160 (1985-10-01), Brand et al.
patent: 4686547 (1987-08-01), Hayashi
patent: 4842983 (1989-06-01), Hasegawa
patent: 4851319 (1989-07-01), Walls et al.
patent: 5002856 (1991-03-01), Anderson
patent: 5071731 (1991-12-01), Chen et al.
patent: 5072029 (1991-12-01), Hertler
patent: 5077174 (1991-12-01), Bauer et al.
J. V Crivello, Polymeric Materials Science and Engineering Preprints, vol. 61, Amer. Chem. Soc. Mfg. FL Sep. 1989 pp. 62-66.
Kearns, et al., Journal of Macromolecular Science and Chemistry, A8(4), (1974), pp. 673-685.
Anderson Albert G.
Chen Yuan Yu G.
Hertler Walter R.
Wheland Robert C.
Bowers Jr. Charles L.
E. I. Du Pont de Nemours and Company
Young Christopher G.
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