Polysilicon conductor width measurement for 3-dimensional FETs

Details Polysilicon conductor width measurement for 3-dimensional FETs Polysilicon conductor width measurement for 3-dimensional FETs

2007-06-05

2007-06-05

Lee, Eugene (Department: 2815)

Active solid-state devices (e.g., transistors, solid-state diode

Test or calibration structure

C257S308000, C257S021000, C438S176000, C438S283000, C438S157000

Reexamination Certificate

active

10944622

ABSTRACT:
An apparatus and method is disclosed for determining polysilicon conductor width for 3-dimensional field effect transistors (FinFETs). Two or more resistors are constructed using a topology in which polysilicon conductors are formed over a plurality of silicon “fins”. A first resistor has a first line width. A second resistor has a second line width. The second line width is slightly different than the first line width. Advantageously, the first line width is equal to the nominal design width used to make FET gates in the particular semiconductor technology. Resistance measurements of the resistors and subsequent calculations using the resistance measurements are used to determine the actual polysilicon conductor width produced by the semiconductor process. A composite test structure not only allows calculation of the polysilicon conductor width, but provides proof that differences in the widths used in the calculations do not introduce objectionable etching characteristics of the polysilicon conductors.

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