Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-03-01
2005-03-01
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S907000, C430S925000, C430S325000, C430S330000, C430S967000
Reexamination Certificate
active
06861197
ABSTRACT:
A base polymer having incorporated an ester group having a fluorinated alicyclic unit is provided. A resist composition comprising the polymer is sensitive to high-energy radiation, and has excellent sensitivity at a wavelength of less than 200 nm, significantly improved transparency by virtue of the fluorinated alicyclic units incorporated as well as satisfactory plasma etching resistance. The resist composition has a low absorption at the exposure wavelength of a F2laser and is ideal as a micropatterning material in VLSI fabrication.
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Endo Masayuki
Harada Yuji
Hatakeyama Jun
Kawai Yoshio
Kishimura Shinji
Central Glass Co. Ltd.
Matsushita Electric - Industrial Co., Ltd.
Millen White Zelano & Branigan P.C.
Shin-Etsu Chemical Co. , Ltd.
Thornton Yvette C.
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