Polymer, resist composition and patterning process

Details Polymer, resist composition and patterning process Polymer, resist composition and patterning process

2006-10-30

2010-02-23

Kelly, Cynthia H (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S322000, C430S326000, C526S245000

Reexamination Certificate

active

07666571

ABSTRACT:
A polymer of which dissolution rate in an alkaline developer increases under the action of acid comprises recurring units having formulae (1) and (2) wherein R1, R2, and R4are H or methyl, R3is difluoromethyl or trifluoromethyl, and X is tertiary alkyl. A resist composition comprising the polymer has a high sensitivity and resolution, decreased pattern collapse during development, and minimized MEF and is best suited as micropatterning material for the VLSI manufacture.

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