Polymer, resist composition and patterning process

Details Polymer, resist composition and patterning process Polymer, resist composition and patterning process

2004-09-09

2009-10-13

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S910000, C430S326000, C430S330000, C526S268000, C526S270000

Reexamination Certificate

active

07601479

ABSTRACT:
A polymer comprising recurring units of formulae (1) to (4) wherein R1, R3, R4and R7are hydrogen or methyl, R2is an acid labile group, R5and R6are hydrogen or hydroxyl, and R8is a lactone structure group and having a Mw of 1,000-50,000 is provided. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and etching resistance and lends itself to lithographic micropatterning with electron beams or deep UV.

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