Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1998-04-14
2000-05-16
Powell, William
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
216 70, 216 75, 438711, 438725, H01L 21302, B08B 600
Patent
active
060622377
ABSTRACT:
A process for producing a strip removes photoresist and extraneous deposits of polymer residue on the top surface and sidewalls of a post-metal etch wafer. The photoresist and residue are processed simultaneously by a chemical mechanism comprising reactive species derived from a microwave-excited fluorine-containing downstream gas, and a physical mechanism comprising ion bombardment that results from a radio frequency excited plasma and accompanying wafer self bias. A vacuum pump draws stripped photoresist and residues from the surface of the wafer and exhausts them from the chamber.
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patent: 5792314 (1998-08-01), Shima et al.
patent: 5811022 (1998-09-01), Savas et al.
"A Dry Process for Stripping As.sup.+ IonImplanted Photoresist"; Jap. J. of Appl. Phys.; Part 1 (Regular Papers & Short Notes) (Jun. 1992), vol. 31, No. 6B, pp. 2035-2040.
Brown William
Herchen Harald
Merry Walter
Welch Michael
Applied Materials Inc.
Glenn Michael
Goudreau George
Powell William
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