Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2011-01-04
2011-01-04
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S271100, C430S313000, C430S449000, C528S205000, C528S425000, C438S952000
Reexamination Certificate
active
07862990
ABSTRACT:
An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
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Hyung Kyung Hee
Kim Jong Seob
Kim Min Soo
Lee Jin Kuk
Oh Chang Il
Cheil Industries Inc.
Hamilton Cynthia
Lee & Morse P.C.
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