Polishing pad having a grooved pattern for use in a chemical mec

Abrading – Flexible-member tool – per se – Interrupted or composite work face

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Details

451529, 451550, B24D 1100

Patent

active

059847697

ABSTRACT:
A polishing pad for a chemical mechanical polishing apparatus. The polishing pad includes a plurality of concentric circular grooves. The polishing pad may include multiple regions with grooves of different widths and spacings.

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