4. Coating apparatus
  5. Gas or vapor deposition
  6. Crucible or evaporator structure

Darin S. Olson

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Method and apparatus for use of hydrogen and silanes in plasma

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate

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Point-of-use vaporization system and method

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent

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Profile ID: LFUS-PAI-P-1610207

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