Plasma source and plasma processing apparatus

Details Plasma source and plasma processing apparatus Plasma source and plasma processing apparatus

2004-05-28

2009-12-15

Hassanzadeh, Parviz (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER

Reexamination Certificate

active

07632379

ABSTRACT:
A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).

REFERENCES:
patent: 6350961 (2002-02-01), Jung
patent: 2003/0049468 (2003-03-01), Hu et al.
patent: 2003/0052096 (2003-03-01), Crowe et al.
patent: 2006/0042545 (2006-03-01), Shibata et al.
patent: 62-159419 (1987-07-01), None
patent: 06-163467 (1994-06-01), None
patent: 06-216078 (1994-08-01), None
patent: 07-058087 (1995-03-01), None
patent: 07-073994 (1995-03-01), None
patent: 07-106311 (1995-04-01), None
patent: 10-053877 (1998-02-01), None
patent: 10-144669 (1998-05-01), None
patent: 2000-036634 (2000-02-01), None
patent: 2000-057934 (2000-02-01), None
patent: 2001-226775 (2001-08-01), None
patent: 2001-526325 (2001-12-01), None
patent: 2002-289399 (2002-10-01), None
patent: 2002-370059 (2002-12-01), None
patent: 2003-234335 (2003-08-01), None
patent: 2004-158839 (2004-06-01), None
patent: 2004-227990 (2004-08-01), None
International Search Report dated Sep. 7, 2004 with English Translation thereof. (Four (4) pages).

Affiliated with

Also associated with

Rating

Plasma source and plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma source and plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma source and plasma processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4073180