Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1994-07-18
1996-07-30
Breneman, R. Bruce
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429831, 20429833, 156345, 118732E, 118723I, 118723IR, C23F 100, C23C 1600, C23C 1434
Patent
active
055408249
ABSTRACT:
Capacitive coupling and RF power dissipation is advantageously reduced in the present invention by employing an RF coil having plural coil sections, each coil section connected across an RF source, commonly tapped ones of the coil sections being wound in opposite directions. Capacitive coupling and RF power dissipation is further reduced by employing a top lid having an outer insulating annulus and an inner conducting disk portion, the conducting disk portion being displaced or spaced apart from the coil by the width of the annulus. This displacement significantly reduces the RF power dissipation or coupling from the top winding of the coil to the lid. Furthermore, the plural coil sections or mirror coil configuration reduces sputtering of insulative material induced by capacitive RF coupling.
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Hanawa Hiroji
Ma Diana X.
Olgado Donald
Yin Gerald Z.
Applied Materials
Breneman R. Bruce
McDonald Rodney G.
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