Plasma reactor for processing a workpiece and having a...

Adhesive bonding and miscellaneous chemical manufacture – Methods – Making electrical conductors of indefinite length

Reexamination Certificate

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C118S7230AN

Reexamination Certificate

active

07967930

ABSTRACT:
A plasma reactor is provided for processing a workpiece such as a transparent mask or a semiconductor wafer. The reactor includes a vacuum chamber having a ceiling and a sidewall. A workpiece support pedestal within the chamber includes a metal cathode having a support surface facing the ceiling and defining a support plane for supporting a workpiece. The cathode has a hollow space formed within its interior. The reactor further includes a movable metal element within the hollow space and a mechanism for controlling a distance between the metal element and the support plane.

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