Plasma processor with electrode responsive to multiple RF...

Details Plasma processor with electrode responsive to multiple RF... Plasma processor with electrode responsive to multiple RF...

2007-01-30

2007-01-30

Vo, Tuyet (Department: 2821)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER, C315S111210

Reexamination Certificate

active

10855706

ABSTRACT:
A plasma processor processing a workpiece includes sources having frequencies 2 MHz, 27 MHz, and 60 MHz, applied by three matching networks to an electrode in a vacuum chamber including the workpiece. Alternatively 60 MHz is applied to a second electrode by a fourth matching network. The matching networks, substantially tuned to the frequencies of the sources driving them, include series inductances so the 2 MHz inductance exceeds the 27 MHz network inductance, and the 27 MHz network inductance exceeds the inductances of the 60 MHz networks. The matching networks attenuate by at least 26 DB the frequencies of the sources that do not drive them. Shunt inductors between the 27 and 60 MHz sources decouple 2 MHz from the 27 and 60 MHz sources. A series resonant circuit (resonant to about 5 MHz) shunts the 2 MHz network and the electrode to help match the 2 MHz source to the electrode.

REFERENCES:
patent: 5556549 (1996-09-01), Patrick et al.
patent: 5897713 (1999-04-01), Tomioka et al.
patent: 6071372 (2000-06-01), Ye et al.
patent: 6127278 (2000-10-01), Wang et al.
patent: 6153068 (2000-11-01), Ohmi et al.
patent: 6303510 (2001-10-01), Chien et al.
patent: 6387287 (2002-05-01), Hung et al.
patent: 6485602 (2002-11-01), Hirose
patent: 6506674 (2003-01-01), Ikeda et al.
patent: 6849154 (2005-02-01), Nagahata et al.

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