Plasma processor coil

Details Plasma processor coil Plasma processor coil

2002-09-13

2009-08-11

Hassanzadeh, Parviz (Department: 1792)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345480

Reexamination Certificate

active

07571697

ABSTRACT:
A plasma processor coil can include a shorting turn ohmically or only reactively coupled to plural multi-turn, co-planar, interleaved spiral, parallel connected windings. A separate capacitor can be associated with each winding to shunt current from one portion of that winding to another portion of the winding. The spacing between adjacent turns of peripheral portions of each winding can differ from the spacing between adjacent turns of interior portions of each winding. The coil can have a length that is short relative to the wavelength of RF excitation for the coil.

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