Plasma processing method and apparatus

Details Plasma processing method and apparatus Plasma processing method and apparatus

1992-04-06

1994-02-01

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427534, 427535, 427570, 427569, 156643, 20419232, B05D 306, C23C 1600, C25F 300

Patent

active

052830870

ABSTRACT:
A plasma process and an apparatus therefor are described. A number of substrates are disposed between a pair of electrodes, to which a high frequency electric power is applied in order to generate glow discharge and induce a plasma. The substrates in the plasma are applied with an alternating electric field. By virtue of the alternating electric field, the substrates are subjected to sputtering action.

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