Plasma processing apparatus with a lisitano coil

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

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31511161, 31511171, H01J 724, H05B 3126

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active

049738836

ABSTRACT:
A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. The microwave generator consists of a lisitano coil which is capable of emitting a microwave in the TE.sub.011 mode. In the light of such a microwave, a high quality film can be deposited.

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patent: 4778561 (1988-10-01), Ghahbari
patent: 4806829 (1989-02-01), Nakao

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