Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1988-04-29
1990-11-27
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511161, 31511171, H01J 724, H05B 3126
Patent
active
049738836
ABSTRACT:
A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. The microwave generator consists of a lisitano coil which is capable of emitting a microwave in the TE.sub.011 mode. In the light of such a microwave, a high quality film can be deposited.
REFERENCES:
patent: 4166760 (1979-09-01), Fowler et al.
patent: 4293794 (1981-10-01), Kapetanakos
patent: 4438368 (1984-03-01), Abe et al.
patent: 4481229 (1984-11-01), Suzuki et al.
patent: 4713585 (1987-12-01), Ohno et al.
patent: 4745337 (1988-05-01), Pichot et al.
patent: 4778561 (1988-10-01), Ghahbari
patent: 4806829 (1989-02-01), Nakao
Hirose Naoki
Inugima Takashi
Takayama Toru
LaRoche Eugene R.
Semiconductor Energy Laborator Co., Ltd.
Shingleton Michael
LandOfFree
Plasma processing apparatus with a lisitano coil does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing apparatus with a lisitano coil, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus with a lisitano coil will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1033890