Plasma processing apparatus for producing plasma at low electron

Details Plasma processing apparatus for producing plasma at low electron Plasma processing apparatus for producing plasma at low electron

1996-11-20

1999-08-10

Kinkead, Arnold

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 31511141, 216 70, 216 71, 118723I, 20429834, 20429806, H05B 3700

Patent

active

059363525

ABSTRACT:
A plasma processing apparatus includes a plasma chamber and an antenna formed by a first set of parallel antenna elements and a second set of parallel antenna elements, the antenna elements of the first set being interdigitally arranged with those of the second set. An energy source supplies oscillation energy of first phase to the first set of antenna elements and oscillation energy of second, opposite phase to the second set of antenna elements to produce oppositely moving energy fields in the chamber at such a frequency that electrons are confined in a plasma produced in the chamber.

REFERENCES:
patent: 5397962 (1995-03-01), Moslehi
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5464476 (1995-11-01), Gibb et al.
patent: 5565738 (1996-10-01), Samukawa et al.

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